Oxygen plasma refers to any plasma cleaning process where oxygen is also used in the plasma chamber. Oxygen is also used in cleaning processes that are carried out before bonding. Oxygen can also be combined with other gasses as well to etch a surface. It wouldn’t be wrong to say that oxygen is the most common gas that is used in plasma cleaning. This is mainly due to its wide availability and low cost. Oxygen plasma can be created by using an oxygen source on a plasma system. Furthermore, all systems that are available for plasma etching can work with oxygen, since it is commonly used to clean non-metal surfaces such as glass, Teflon and plastics, and also increases the non-metallic surface’s wettability.(RP Plasma)
Oxygen plasma refers to any plasma cleaning process where oxygen is also used in the plasma chamber. Oxygen is also used in cleaning processes that are carried out before bonding. Oxygen can also be combined with other gasses as well to etch a surface. It wouldn’t be wrong to say that oxygen is the most common gas that is used in plasma cleaning. This is mainly due to its wide availability and low cost. Oxygen plasma can be created by using an oxygen source on a plasma system. Furthermore, all systems that are available for plasma etching can work with oxygen, since it is commonly used to clean non-metal surfaces such as glass, Teflon and plastics, and also increases the non-metallic surface’s wettability.(RP Plasma)